Working principle of HIPIMS pulsed magnetron sputtering

Pulsed magnetron sputtering is a kind of magnetron sputtering which replaces the traditional DC power supply with a rectangular wave voltage pulse supply

Magnetron sputtering technology is divided into direct current (DC) magnetron sputtering, medium frequency (MF) magnetron sputtering and radio frequen

Vacuum magnetron sputtering coating, vacuum evaporation coating magnetron sputtering can be divided into DC magnetron sputtering, medium frequency (MF) magnetron sputtering,

Difference between vacuum magnetron sputtering coating technology and vacuum evaporation coating technology

Vacuum magnetron sputtering coating technology is different from vacuum evaporation coating technology. Sputtering refers to the phenomenon of nuclear particles bombarding a solid surface (target), so that solid atoms or molecules are ejected from the surface.

What are the factors affecting the performance of vacuum coating?

Key points of production and quality control of coating process

The working principle of vacuum coating is that the film evaporates at high temperature and crystallizes on the surface of the workpiece. Because the air will produce resistance to the evaporation of the membrane molecules caused by collision so that the crystal becomes rough and matt, 

Coating power supply in vacuum coating (magnetron sputtering), why is pulse bias power supply better than DC power supply?

Vacuum coating A technique for producing thin film materials by physical means. In the vacuum chamber atoms of the material are isolated from the heating source and hit onto the surface of the plated object.